Photoresist

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FUJIFILM Electronic Materials Inc. offers a wide range of advanced imaging products, to meet the needs of it’s customers around the world. The photoresist product line encompasses a wide range of applications including broadband, g-line, i-line, 248nm, 193nm (dry and immersion), e-beam and EUV technology. The portfolio also includes a unique negative tone development resist system to address next generation needs, including double patterning.

We’re one of the world’s leading suppliers of photoresists offering the widest array of products for all your imaging needs.