FUJIFILM Electronic Materials products meet and exceed the needs of the world’s leading device makers with advanced photoresists, polyimides, high-purity formulated products and thin films systems.
Innovation and investment in the future are hallmarks of our approach.
For detailed product information select a product link:
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Photoresists
Extremely high resolution state-of-the-art resists for sub-65nm geometries in 193nm and 248nm technology through i-line, g-line and broadband photoresists including isoprene based negative technologies.
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Polyimides and Polybenzoxazoles
Specialty coatings used as a protective layer "buffer coat" or redistribution layer. Specifically engineered for Fabs running amine sensitive processes, our aqueous developable AP 2210B and AN 3310 products offer opportunity for developer consolidation within the Fab.
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Formulated Products
A comprehensive range of specialty etchants, cleaners, removers and other ancillary products designed to compliment the FUJIFILM Electronic Materials photoresist and polyimide product lines.
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Thin Films Systems
A full range of ultra-pure CVD and diffusion chemicals as well as high purity delivery systems designed to provide cost saving turn-key “system solutions” and next generation technologies to the semiconductor industry. The Thin Film Systems group is dedicated to being the prominent source of value to OEMs and end users.
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Color Mosaic®
The FUJIFILM Electronic Materials Color Mosaic® technology is a photosensitive-pigmented material used to produce the color filter array which is incorporated in Image Sensor devices. The technology is used worldwide by manufacturers to produce the red, green and blue color pixels found in leading-edge products. The Color Mosaic® technology produces a color filter with high transparency and colorimetric purity.