News

North Kingston, RI, July 17, 2007 -- FUJIFILM Electronic Materials U.S.A., Inc. and Air Products (NYSE:APD) today announced that they have signed a sole, international licensing agreement for Air Products’ patented PDEMS™ interlayer dielectric (ILD) Process. The technology is designed to make a porous low-k dielectric material by plasma-enhanced chemical vapor deposition (PECVD).

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Fuji Film Electronic Materials was named a recipient of Intel Corporation's Preferred Quality Supplier (PQS) award for outstanding performance in providing products and services deemed essential to Intel's success. The company was awarded for its efforts in supplying Intel with advanced materials and wet chemistry and equipment for semiconductor manufacturing. Fuji Film Electronic Materials and 25 additional PQS award winners will be honored at a celebration in Burlingame, California on March 21.

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Fuji Photo Film Co., Ltd. (President and CEO: Shigetaka Komori; hereinafter referred to as "Fujifilm") has reached agreement with Arch Chemicals, Inc. ("Arch Chemical") to purchase the 50% equity stake in Planar Solutions, LLC ("Planar") currently held by Arch Chemical through a subsidiary, FUJIFILM Electronic Materials U.S.A., Inc., in a transaction valued at approximately US$17 million.

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We are pleased to announce that Fuji Photo Film Co, Ltd headquartered in Tokyo, Japan has acquired the products business of Arch Microelectronic Materials and has created a new company, FUJIFILM Electronic Materials. This new era for our Microelectronic Materials products business will be the best in our history. Our mission is clear: to serve our customers with enabling products which enhance the value of your products and your enterprise. We are working hard every day to earn and be an integral part of your business.

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