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Advanced Chemistry Global Solutions

Successful semiconductor manufacturers move quickly, demand quality and require leading technology. We offer the broadest line worldwide of photoresists, polyimides, thin film systems and other high purity chemicals and services to technologically demanding semiconductor customers.

Interface ™

Advanced Lithography Workshop 2008

FUJIFILM Electronic Materials announces the 45th InterfaceTM Advanced Lithography Workshop.
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Safety

Request Material Safety Data Sheets

Please feel free to contact us for your MSDS requirements.
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Product Spotlight

Color Mosaic®

FUJIFILM Color Mosaic® photosensitive-pigmented material used to produce the color filter array which is incorporated in liquid crystal displays and image sensors.
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AP2210

FUJIFILM AP2210 advanced aqueous developable buffer coat material. Applications include RDL and ILD.
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