Photoresist

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FUJIFILM Electronic Materials Inc. offers a wide range of advanced imaging products, to meet the needs of it’s customers around the world. The photoresist product line encompasses a wide range of applications including broadband, g-line, i-line, 248nm, 193nm (dry and immersion), e-beam and EUV technology. The portfolio also includes a unique negative tone development resist system to address next generation needs, including double patterning.

We’re one of the world’s leading suppliers of photoresists offering the widest array of products for all your imaging needs.

FUJIFILM Electronic Materials offers a variety of PMMA and PMMA/MAA resists to meet customer needs. PMMA is a one component high resolution positive working resist with wide process latitude and excellent film forming characteristics, for electron beam, X-ray and some deep UV applications. Very high aspect ratios are achievable in sub-micron ranges. The results are entirely dependent on process conditions and several options are available. Contact us for more information.