Photoresist

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Advanced Resists

FUJIFILM Electronic Materials Inc. offers a wide range of advanced imaging products, to meet the needs of it’s customers around the world. The photoresist product line encompasses a wide range of applications including broadband, g-line, i-line, 248nm, 193nm (dry and immersion), e-beam and EUV technology. The portfolio also includes a unique thin imaging system technology, TIS2000, which addresses the litho-etch tradeoff encountered with advanced low k1 imaging processes for both 193 and 248 nm applications.

Advanced Photoresist Product Roadmap (PDF149KB)

Core Photoresists

We’re one of the world’s leading suppliers of photoresists offering the widest array of products for all your imaging needs.

Core Photoresist Product Portfolio (PDF:46.6KB)

Negative Acting Photoresists

SC Resist (PDF:45.1KB)
HNR Resist (PDF:36.5KB)
WNRD Developer (PDF:54.8KB)

Positive Optical Photoresists

HPR 500 (PDF:59.3KB)
HiPR 6500 (PDF:37.6KB)
OCG 825 (PDF:60.2KB)
OiR 906 (PDF:25.7KB)

OiR 907 (PDF:38.2KB)
OiR 908 (PDF:55.1KB)
OiR 620 (PDF:26.2KB)
OiR 674 (PDF:52.1KB)

PMMA and PMMA/MAA Positive Electron Resists

FUJIFILM Electronic Materials offers a variety of PMMA and PMMA/MAA resists to meet customer needs. PMMA is a one component high resolution positive working resist with wide process latitude and excellent film forming characteristics, for electron beam, X-ray and some deep UV applications. Very high aspect ratios are achievable in sub-micron ranges. The results are entirely dependent on process conditions and several options are available. Contact us for more information.

PMMA (PDF:15.6KB)